Production of single crystal thin film

Abstract

Abstract PURPOSE: To form a single crystal thin film of an arbitrary size on a quartz glass substrate, a polycrystal or different crystal substrate or the like by using a single crystal thin layer seed of the same material as a thin film in a microzone melting process. CONSTITUTION: By vacuum deposition, sputtering, a CVD method or other method thin film 2 is formed on substrate 1 made of glassy material such as quartz glass or polycrystal or different crystal material having a m.p. higher than that of a single crystal thin film material to be formed. On film 2 single crystal thin layer 3 of the same material as film 2 is placed and irradiated with laser beams to melt part of layer 3 first. By slowly shifting the molten part film 2 is melted in succession. Thus, a crystal coinciding with the single crystal material is solidification-formed at a peripheral portion of the single crystal portion, and using the crystal as seed a single crystal is similarly solidified in the molten film in succession to obtain a single crystal thin film. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Tatsuo Izawa
• 👤 Hidefumi Mori
• 👤 Masao Tachikura

Bibliographic Details