Formation of circuit pattern

Abstract

Abstract PURPOSE: To improve pattern precision by dividing a mask pattern, which is made to correspond to each layer pattern of one LSI chip, into several regions and by forming the pattern of one LSI chip by using each region for a mask. CONSTITUTION: On mask 2 1 , divided pattern A 1 of the layer is arranged and printed repeatedly by the step-and-repeat camera by using the reticle equivalent to this region A, and divided pattern B 1 of the 1st layer is printed by using reticle equivalent to region B as well. For the purpose of forming the pattern of the 2nd layer, divided patterns A 2 and B 2 are repeatedly arranged and printed on mask 2 2 in the same way, and at need, the 1st and 2nd layers are both provided with marks (a 1 ) and (b 1 ), and (a 2 ) and (b 2 ). The 3rd layer and follows are formed in the same way and obtained masks 2 1 and 2 2 to 2 n are used in sequence for exposing the photo resist adhered onto the semiconductor substrate, thereby obtaining a highly-precise circuit pattern. COPYRIGHT: (C)1979,JPO&Japio

Inventors

• 👤 Tatsuya Enomoto

Bibliographic Details