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JPS5458792A Expired / Lapsed JP ⏱️ 0.0 years remaining

Photo-sensitive resin composition

Assignee: Teijin Ltd
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Filing: 1977-10-19
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Granted: —
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Expires: 1997-10-19
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Abstract

Abstract PURPOSE: The title composition developable by an aqueous solvent, consisting of a specific photo-sensitive polymer, a polymerizable monomer having an ethylenic double bond, and a photosensitizer. CONSTITUTION: A) A photo-sensitive polymer is blended with B) 20W100wt.% of a monomer having a polymerizable ethylenic double bond, and C) 0.005W 1.0wt.% of a photosensitizer based on the total weight of A) and B). A) The photo-sensitive polymer has terminal groups hindered by the groups shown by the formulas I and X (R 1 is H or methyl; R 2 is 2W5C alkylne; p is 1W20; R 3 is tetra functional organic group whose direct bonds a and b, and c and d are bonded to the neighboring carbon atoms respectively; R 4 residue after removal of terminal hydroxyl groups from an aliphatic polyester and/or am aliphatic polyol having an average molecular weight of 300W4000 and terminal hydroxyl groups) and a main chain consisting of repeating units shown by the formulas III and/or IV (R 5 is 2W15C aliphatic, alicylic, or aromatic group; the direct bonds and f are bonded, but the directbonds and e, the direct bonds f and f are not) COPYRIGHT: (C)1979,JPO&Japio

Inventors

  • 👤 Kaoru Iwata
  • 👤 Tsuneo Hagiwara
  • 👤 Akihiro Horiie

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-31 16:00
CPC Classifications
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