Photomask material

Abstract

Abstract PURPOSE: To form a reflection preventing thin photmask material which has superior film characteristics and is not charged with static electricity, by superposing chromium films and a chromium oxide film by use of specific methods on a substrate covered with a transparent electrically conductive film. CONSTITUTION: Transparent electrically conductive film 2 made of indium oxide, tin oxide, etc. with a surface resistance less than about 10 KΩ/square is formed on transparent substrate 1. On substrate 1, about 200W800Å thick chromium film 3, about 100W300Å thick chromium film 4 and about 150W400Å thick chromium oxide film 5 are successively formed in layers by sputtering, vacuum deposition and vacuum deposition, respectively. The total light transmission density of films 3,4 is desirable to be a value above 2.5 and near 2.5 in respect of resolving power COPYRIGHT: (C)1979,JPO&Japio

Inventors

• 👤 Kunio Sakurai
• 👤 Kunio Masumoto
• 👤 Hiroshi Ito

Bibliographic Details