X-ray exposure device

Abstract

Abstract PURPOSE: To obtain an X-ray exposure device which is capable of high-accuracy exposure for an ultraminute pattern. CONSTITUTION: X-rays 52 emitted from X-ray source 10 are first black-reflected by parabolic diffraction grid surfaces 54aW54c of first semi-cylindrical collimator 54 made of the curved crystal to be irradiated on second semi-cylindrical collimator 64 made of curved crystal. Collimator 64 is located so that its axis may be orthogonal to collimator 54. Thus, the X-rays collimated through collimator 54 is black- reflected via diffraction grid surfaces 64aW64e of collimator 64 in terms of the axis perpendicular to the axis of collimator 54 to be collimated. In this way, the X-rays collimated via two axes are irradiated to the X-ray sensitizer layer on semiconductor wafer 18 via mask 16. Thus, the collimators are installed to collimate the X-rays given from the X-ray source, and the collimated X-rays are irradiated on the mask COPYRIGHT: (C)1979,JPO&Japio

Inventors

• 👤 Mitsuhiro Morita

Bibliographic Details