JPS5384684A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Plasma etching device
Assignee: Fujitsu Ltd
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Filing: 1976-12-29
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Granted: —
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Expires: 1996-12-29
Abstract
Abstract PURPOSE: To evenly etch even a large area semiconductor substrate by detaching a plasma generating part and a specimen heating part. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Hiroshi Tokunaga
- 👤 Nobuo Toyokura
- 👤 Masaichi Shinoda
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-05 01:47
CPC Classifications
—
Claims Analysis
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References Cited (Backward Citations)
JPS5184580A
Cited
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