JPS5380168A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Exposure method for electronic beam
Assignee: Fujitsu Ltd
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Filing: 1976-12-25
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Granted: —
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Expires: 1996-12-25
Abstract
Abstract PURPOSE: To ensure an sccurate formation of an exposure pattern with a width in accordance with the exposure point number, by correcting the stay time of the electronic beam in accordance with the exposure point number and based on the prescribed equations. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Hiroshi Yasuda
- 👤 Haruo Tsuchikawa
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-03 10:44
CPC Classifications
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