JPS5364676A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Treating apparatus in gas phase
Assignee: Hitachi Ltd
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Filing: 1976-11-22
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Granted: —
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Expires: 1996-11-22
Abstract
Abstract PURPOSE: To make gas circulation at each part in a treating chamber uniform so as to make treating effect for material to be treated uniform by installing plural gas feeeding holes at nearly symmetrical position on both sides of inside wall of cylindrical treating chamber along the bus bar. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Yasuo Maruyama
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-23 13:03
CPC Classifications
—
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