JPS5359368A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Plasma etching
Assignee: Hitachi Ltd
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Filing: 1976-11-10
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Granted: —
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Expires: 1996-11-10
Abstract
Abstract PURPOSE: To perform minute processing by plasma-etching PSG films in an atmosphere including organic compound having specially F, H and O. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Hiroshi Yanagisawa
- 👤 Yoshifumi Kawamoto
- 👤 Toshiharu Matsuzawa
- 👤 Kikuo Doda
- 👤 Tetsukazu Hashimoto
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-05 01:05
CPC Classifications
—
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