JPS5339115A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photosensitive recording medium
Assignee: Hitachi Ltd
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Filing: 1976-09-22
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Granted: —
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Expires: 1996-09-22
Abstract
Abstract PURPOSE:To prevent stripping of a positive type photoresist from a base plate, and shorten a process, by adding a specified silane coupling agent to the photoresist consisting of a phenol novolak resin and quinone diazide.
Inventors
- 👤 Tadao Kaneko
- 👤 Motoo Akagi
- 👤 Keizo Kato
- 👤 Yoichi Oba
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 12:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0751
Claims Analysis
Total Claims: 0
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