JPS5329672A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Gas etching apparatus
Assignee: Toshiba Corp
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Filing: 1976-08-31
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Granted: —
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Expires: 1996-08-31
Abstract
Abstract PURPOSE: To prolong the life of a gas etching apparatus by making an etching chamber, etching gas transporting system and supporting members within the etching chamber through the use of fluorine resins or covering these with said resins. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Yasuhiro Horiike
- 👤 Masahiro Shibagaki
- 👤 Takashi Yamazaki
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 05:16
CPC Classifications
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