JPS5329080A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Electron beam exposure system
Assignee: Mitsubishi Electric Corp
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Filing: 1976-08-30
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Granted: —
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Expires: 1996-08-30
Abstract
Abstract PURPOSE: To perform the exposure of fine patterns by imaging the reflected electron beams from a flat plate of patterns of a material of a different reflection coefficient to the same size or similarity on a second flat plate via lenses. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Hiroshi Shibata
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-05 10:34
CPC Classifications
—
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