JPS5318964A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
X-ray projection and exposure system
Assignee: NTT Inc
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Filing: 1976-08-06
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Granted: —
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Expires: 1996-08-06
Abstract
Abstract PURPOSE: To increase the margin of space controlling of a mask and a wafer without decreasing pattern accuracy and without increasing exposure time by inserting an X-ray collimator between an X-ray source and a mask. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Toa Hayasaka
- 👤 Satoru Nakayama
- 👤 Shinichi Yamazaki
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 05:22
CPC Classifications
—
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