JPS5315768A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Production of semiconductor device
Assignee: NTT Inc
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Filing: 1976-07-28
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Granted: —
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Expires: 1996-07-28
Abstract
Abstract PURPOSE: To accurately form fine patterns by applying a temperature allowing for the change component of the relative relation of patterns on a substrate before and after intermediate treatment in forming a second pattern. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Kazumasa Ono
- 👤 Kazuhide Kiuchi
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-01 10:19
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70466; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875
Claims Analysis
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References Cited (Backward Citations)
JPS50145263U
Cited
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