JPS5314568A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photolithography treatment system device
Assignee: Hitachi Ltd
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Filing: 1976-07-26
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Granted: —
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Expires: 1996-07-26
Abstract
Abstract PURPOSE: To form fine patterns of good contact characteristics by developing positive type photo resist then radiating ultraviolet rays to the entire surface thereby sensitizing the surface skin part of the resist. COPYRIGHT: (C)1978,JPO&Japio
Inventors
- 👤 Toshihiko Takayanagi
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 15:01
CPC Classifications
—
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