JPS5271978A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Production of semiconductor device
Assignee: NEC Corp
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Filing: 1975-12-11
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Granted: —
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Expires: 1995-12-11
Abstract
Abstract PURPOSE: To discontinuously isolate the required portions and unrequired portions of the electrode wiring formed and obtain good wiring patterns by making a second photo resist film in a structure wherein it overhangs from the end of a metal or metal oxide film and a first photo resist film. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Kiyoto Iida
- 👤 Takashi Okuda
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-02 18:33
CPC Classifications
—
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