JPS525682A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Sputtering apparatus for long length substrates
Assignee: SPC Electronics Corp
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Filing: 1975-07-02
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Granted: —
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Expires: 1995-07-02
Abstract
Abstract PURPOSE:A sputtering apparatus for continuously forming a thin film on a longlength substrate without producing residual strain.
Inventors
- 👤 Tetsuo Ito
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-06 03:12
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/562
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