JPS5227286A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Semiconductor manufacturing process
Assignee: NEC Corp
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Filing: 1975-08-26
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Granted: —
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Expires: 1995-08-26
Abstract
Abstract PURPOSE: To provide a double-structured photo-resist layer in integrated semiconductor unit manufacturing process to provide wiring in evaporation, thereby enabling high integration, high reliability wiring. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Masato Tanaka
- 👤 Takehiko Kubota
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-04 21:46
CPC Classifications
—
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