Patent US2708539A successfully refreshed from Google Patents.
JPS5222881A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Thin film etching system on semiconductor base plate
Assignee: Sony Corp
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Filing: 1975-08-14
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Granted: —
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Expires: 1995-08-14
Abstract
Abstract PURPOSE: To cleanly and accurately perform selective etching on multi-crystal silicon layer containing oxygen or nitrogen which has superior characters as an surface stabilizer layer or optical coating layer for a semiconductor unit. COPYRIGHT: (C)1977,JPO&Japio
Inventors
- 👤 Hisao Hayashi
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-05 05:42
CPC Classifications
—
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