Formation of metallic film on surface of organic substrate

Abstract

Abstract PROBLEM TO BE SOLVED: To form a metallic film with sufficiently high adhesion on the surface of a smooth org. substrate by activating the surface of the org. substrate by photoirradiation, etc., and executing a vapor growth method after treating with a silane coupling agent containing a specified sulfur atom. SOLUTION: The activating treatment is applied on the surface of the org. substrate such as epoxy resin. This treatment is executed by an irradiation treatment of a light such as laser having a wavelength activating a bond or a plasma treatment. Then the surface of the substrate is subjected to a coupling treatment with a sulfur atom containing silane coupling agent expressed by the general formula, X-Si-(OR)3 (X is an org. reactive group containing sulfur atom. R is-CH3 or-CH2 -CH3 ). In this way, a mercapto group excellent in reactivity with metal is formed. Then the material is heat-treated at about 50-120 deg.C at need or subjected to the plasma treatment with a gas plasma such as oxygen, nitrogen and argon, then the metallic film is formed on this substrate surface by using the vapor growth method.

Inventors

• 👤 Kouichi Kusumura
• 👤 浩一 楠村
• 👤 Takao Hayashi
• 👤 隆夫 林

Bibliographic Details