Mass spectrometer and ion implantation method

Abstract

Abstract PURPOSE: To prevent the generation of dust in a device, and enhance throughput of an ion implantation process by arranging an electrode along an inner wall of an analyzer tube, and forming an electric field to inversely accelerate an ion going to collide with the inner wall. CONSTITUTION: An inversely accelerating electric field 8 is formed between an earth electrode 4 and a positive electrode also serving as a protective plate 2. A positively electrified unnecessary ion 6 entering a clearance between the electrode 4 and the protective plate 2 without being separated, receives an electric field 8. At this time, accelerating energy in the entering direction 9 of the ion 6 is negated by the electric field 8, and since the electric field 8 between the electrode 4 and the protective plate 2 decelerates the entering unnecessary ion 6, sputtering efficiency at collision time is restrained. The electrode is composed of the protective plate 2 arranged along an inner wall of an analyzer tube 1 and the electrode 4 arranged at a specific interval to this, and the electrode 4 acts as a shielding plate to a mass spectrometric mechanism, and influence of the elecric field 8 to inversely accelerate the unnecessary ion 6 colliding with the inner wall is prevented from being exerted on the mass spectrometric mechanism.

Inventors

• 👤 Takeshi Toyofuku
• 👤 毅 豊福
• 👤 Hiroaki Sekine
• 👤 弘昭 関根

Bibliographic Details