JPH055192A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Method of fast etching
Assignee: Panasonic Electric Works Co Ltd
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Filing: 1991-06-26
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Granted: —
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Expires: 2011-06-26
Abstract
Abstract PURPOSE:To provide the method to make the etching rate fast except by heating the etching liquid. CONSTITUTION:A sensitizer which is excited by absorption of light is added to an etching liquid, and fast etching is performed by using this etching liquid with irradiation of light. The sensitizer absorbs light and is excited to cause energy transfer to the oxygen dissolved in the etching liquid and produce single excited oxygen. This single excited oxygen promotes etching, which is oxidization of metal, and thereby, etching can be effected at high rate.
Inventors
- 👤 Shinichi Iketani
- 👤 晋一 池谷
- 👤 Kohei Kodera
- 👤 孝兵 小寺
Bibliographic Details
Application Number
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Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-31 12:02
CPC Classifications
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