Ultrasonic washing tank

Abstract

Abstract PURPOSE:To make it possible to wash the whole surfaces of a wafer, a substance to be washed, uniformly and in a short time by a construction wherein an ultrasonic radiation plate having an ultrasonic vibrator is provided on the bottom surface of a tank and the slanting surfaces on the opposite sides abutting the bottom surface in an ultrasonic washing tank. CONSTITUTION:A wafer 1 is set in a washing cage 20 and immersed in a washing liquid 3 in a washing tank 21. The immersed washing cage 20 is positioned by guides 5. Next, a high-frequency power is impressed on ultrasonic vibrators 25, 26 and 27 and an ultrasonic waves are applied into the washing liquid 3 from a bottom surface 22 and also from slanting surfaces 23 and 24. The ultrasonic waves applied from the surfaces 22, 23 and 24 respectively are transmitted directly to the wafer 1 and also reflected on tank walls and a liquid surface, and thus the ultrasonic waves are transmitted onto the surfaces of the wafer from various directions. By the ultrasonic waves being applied from the bottom surface 22 and also from the slanting surfaces 23 and 24, accordingly, a washing effect by the ultrasonic waves can be obtained uniformly on the surfaces of the wafer 1.

Inventors

• 👤 Michihiro Hakamata
• 👤 袴田　通博
• 👤 Koichiro Hori
• 👤 浩一郎 堀

Bibliographic Details