Liquid crystal display device

Abstract

Abstract PURPOSE:To form the display device having uniform film quality and film thickness by using a polyimide resin for the interlayer insulating film between a silicon thin film layer produced on a TFT substrate and signal line or scanning lines or terminal lines. CONSTITUTION:After gate electrodes 6 of switching elements (TFTs) are formed, the polyimide resin layer 7 is applied by a spin coater and contact holes are formed; thereafter, the drying known as curing is executed. Drain electrodes 6 and the signal wires 8 are formed thereon. The scanning lines 10 and the scanning lines 8 intersect with each other with the interlayer insulating films held between them. The film thickness of the polyimide resin layer 7 is adjusted to an arbitrary value by changing the rotating speed of the spin coater. The uniform film quality and uniform film thickness are easily obtd. in this way.

Inventors

• 👤 Sumimasa Shimone
• 👤 下根　純理

Bibliographic Details