Method for cleaning carbon material with chlorine fluoride gas

Abstract

Abstract PURPOSE:To enable an effective cleaning of a molded carbon material without damaging the material by bringing the material into contact with a chlorine fluoride gas contg. ClF, ClF3, or ClF5 at a specified temp. range. CONSTITUTION:A molded carbon material is brought into contact with a chlorine fluoride gas contg. at least one gas selected from the group consisting of ClF, ClF3, and ClF5 at 100-350 deg.C to clean the carbon material. Thus, deposit by chemical vapor deposition on the carbon material is very effectively removed without substantially etching the carbon material. Using the chlorine fluoride gas entirely or mainly comprising ClF3 is pref. Deposit of a metal such as W, Si, Ti, V, Nb, Ta, Se, Te, Mo, Re, Os, Ir, Sb, and Ge, and a nitride, carbide and alloy of these metals can be removed by this method.

Inventors

• 👤 Yoshiyuki Kobayashi
• 👤 義幸 小林
• 👤 Takashi Suenaga
• 👤 隆 末永
• 👤 Isamu Mori
• 👤 勇 毛利
• 👤 Tadashi Fujii
• 👤 正 藤井

Bibliographic Details