JPH03217845A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Radiation resist, production thereof and pattern forming method
Assignee: Fujitsu Ltd
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Filing: 1990-01-24
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Granted: —
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Expires: 2010-01-24
Abstract
Abstract Translated from Japanese (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Inventors
- 👤 Akiko Kodachi
- 👤 小太刀 明子
- 👤 Satoshi Takechi
- 👤 敏 武智
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-02 21:00
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758; G03F7/0046; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
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References Cited (Backward Citations)
JPH03278059A
Cited
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