Photoabrasion of film using as base polymer having perfluoalkyl polyether structure by eximer laser light beam

Abstract

Abstract PURPOSE: To enable high accuracy and good photoabberation by irradiating the surface of a film with localized excimer laser beams of specified wavelengths. CONSTITUTION: When the surface of a polymer film essentially consisting of a polymer having a perfluoroalkyl polyether structure is irradiated with localized excimer laser beams of 154 to 350nm wavelength region, the film is subjected to photoabberation. Since this method does not use IR irradiation which has a thermal effect, geometric deformation can be prevented and accurate and good photoabberation can be performed without producing harmful carbon.

Inventors

• 👤 Ernesto Occhiello
• 👤 エルネスト、オッキエロ
• 👤 Alberto Re
• 👤 アルベルト、リ
• 👤 Vincenzo Malatesta
• 👤 ビンセンツォ、マラテスタ
• 👤 Fabio Garbassi
• 👤 ファビオ、ガルバッシ

Bibliographic Details