Color filter manufacturing method

Abstract

Abstract PURPOSE:To easily manufacture the color filter which has a nondefective stable pattern by coating a transparent base material with photosetting photoresist of one of black, red, green, and blue, exposing and developing it by using a photomask, and then exposing the entire surface again in the absence of the photomask. CONSTITUTION:The base material 1 is coated with the photosetting photoresist 2 where pigment of one of black, red, green, and blue is dispersed and the photoresist 2 is irradiated with ultraviolet rays in an exposing process C through the mask where a desired pattern is drawn to print the pattern of the mask on the photoresist 2. Then the resist at the unirradiated part is etched and peeled in a developing process D, and the remaining resist is exposed in a 2nd exposing process F to form 1st picture elements. Those processes are repeated to form 2nd and 3nd picture elements,thus manufacturing the color filter 8 which have black light shield parts 4, red picture elements 5, green picture elements 6, and blue picture elements 7 on the base material 1. Consequently, a stable picture element pattern is formed and the color filter which does not have any defect such as a light leak is obtained.

Inventors

• 👤 Shinichi Aso
• 👤 阿曽　伸一
• 👤 Takashi Inami
• 👤 敬 井波
• 👤 Hirozo Takegawa
• 👤 武川　博三
• 👤 Ryutaro Akutagawa
• 👤 竜太郎 芥川
• 👤 Tokihiko Shimizu
• 👤 清水　時彦

Bibliographic Details