Master disk for production of optical disk

Abstract

Abstract PURPOSE:To form holes or grooves of a precise size at desired precise depth to desired places by providing an intermediate layer which is soluble in an acid soln. and does not interfere with resist layers between the resist layers which are different in sensitivity and are formed on a substrate. CONSTITUTION:The low-sensitivity photoresist layer 2 consisting of a quinone diazide photosensitive material and novolak resin is formed at 2,700A thickness on the glass substrate 1 and the intermediate Ni layer 3 is formed at 50A thickness in contact with the resist layer 2. The high-sensitivity photoresist layer which consists of the quinone diazide photosensitive material and novolak resin and has the sensitivity higher than the sensitivity of the resist layer 2 is formed at 700A thickness in contact with the intermediate Ni layer 3. The Ni intermediate layer 3 is soluble in the acid soln. but is not attacked by the solvent contained by the resist layer 2 and the resist layer 4. The intermediate layer 3 is, therefore, capable of separating the resist layer 2 and the resist layer 4 without mixing these layers. The formation of the holes or grooves having the precise depth size is thus possible.

Inventors

• 👤 Fumiyuki Suzuki
• 👤 文行 鈴木

Bibliographic Details