JPH023048A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photoresist composition using hydroxystylene copolymer as main agent
Assignee: CNA Holdings LLC
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Filing: 1989-01-24
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Granted: —
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Expires: 2009-01-24
Abstract
Abstract PURPOSE: To form a negative image of fine lines by incorporating a specified copolymer and an arom. azido compd. CONSTITUTION: This compsn. contains a copolymer of about 10-90wt.% 4- hydroxystyrene with about 90-10wt.% other monomer selected from among dialkyl muconate, alkyl sorbate, alkadiene and allyl ester of an ethylenic unsatd. acid, and an arom. azido compd. as a sensitizer. It is used as a fine line photoresist in the production of a semiconductor chip, a printed circuit board, etc.
Inventors
- 👤 Balaram Gupta
- 👤 バララム・グプタ
- 👤 Palaiyur Kalyanaraman
- 👤 パライユール・カリアナラマン
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-04 16:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; G03F7/012; G03F7/0125
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