Method and instrument for measuring impurity

Abstract

Abstract PURPOSE:To measure impurities with high sensitivity and high accuracy by moving the liquid drop dropped onto the surface of a material to be measured so as to bring the same into contact with the surface of the material to be measured and analyzing the recovered liquid drop. CONSTITUTION:The liquid drop 17 of an aq. hydrofluoric acid soln. is dropped onto the surface of a wafer 14 by a micropipette 18. A hydrophobic property is imparted to the wafer 24 by the treatment with the vapor of the aq. hydrofluoric acid and, therefore, the liquid drop 17 does not fit to the surface of the wafer 14 and has a spherical shape. The wafer 14 is thereafter inclined or is rotationally moved in various directions so that the liquid drop 17 is scanned and moved over the entire surface of the wafer 14. The soln. in which the natural oxide films previously sticking to the wafer 14 surface are dissolved is recovered by the liquid drop 17 dropped on to the wafer 14 surface. The recovered liquid drop is analyzed by a spectroscopic analysis apparatus, by which the kinds and quantities of the impurities are measured. The degree of contamination of the original wafer is thus judged.

Inventors

• 👤 Ayako Maeda
• 👤 綾子 前田
• 👤 Mokuji Kageyama
• 👤 もくじ 影山
• 👤 Masanobu Ogino
• 👤 荻野　正信
• 👤 Shintaro Yoshii
• 👤 吉井　新太郎

Bibliographic Details