Production of antireflection film

Abstract

Abstract PURPOSE:To form thin films 2 of a desired high refractive index which consist of the inorg. oxide material of the same kind as the material of a transparent plastic base material and have a refractive index difference on the front surface of the above- mentioned base material by using an electron beam type vacuum vapor deposition device and changing the charging power of the electron beam for evaporating the inorg. oxide material. CONSTITUTION:The 1st layer and 2nd layer of the different refractive indices are formed of the same kind of the inorg. oxide material on the front surface of the transparent plastic base material 11 having 1.50 to 1.80 refractive index by changing the charging power of the electron beam which is the heating source of a material 2 for vapor deposition successively from the front surface side of the base material. Such high-refractive index thin films as to attain 0.05<=n2-n1<=0.20 refractive index difference are formed, where the refractive index n1 of the 1st layer is 1.95<=n1<=2.10 and the refractive index n2 of the 2nd layer is 2.00<=n2<=2.20. The low-refractive index thin film consisting of the 3rd layer having 1.45<=n3<=1.47 refractive index n3 is formed of the inorg. oxide material of the kind different from the materials of the 1st and 2nd layers thereon. The respective corresponding optical film thicknesses d are so determined as to attain n1d1=n2d2=n3d3=lambda0/4.

Inventors

• 👤 Yasuhito Owaki
• 👤 泰人 大脇
• 👤 Tsukasa Miyazaki
• 👤 司 宮崎

Bibliographic Details