Cleaning device

Abstract

Abstract PURPOSE:To prevent the metallic pollution of the elements to be cleaned up from occurring by a method wherein an oscillating board to propagate ultrasonics from the generator thereof to a cleaning solution is formed of quartz or silicon. CONSTITUTION:The title cleaning device is composed of a cleaning vessel 4 constituted to clean up the elements to be cleaned up as well as an ultrasonic generator 6 constituted to irradiate said elements with ultrasonics through the intermediary of an oscillating board 7 which is formed of quartz or silicon. In such a constitution, SiO2 exclusively melting into pure water 5 is not to form a pollution source of wafer 1 resultantly the wafer cleaning up process is not obstructed at all. Through these procedures, the metallic pollution of the elements to be cleaned up i.e., the wafer 1 can be prevented from occurring.

Inventors

• 👤 Tsuneo Okada
• 👤 経雄 岡田
• 👤 Kazuhiko Matsuoka
• 👤 松岡　一彦

Bibliographic Details