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JPH01255262A Expired / Lapsed JP ⏱️ 0.0 years remaining

Mos capacitor

Assignee: Toshiba Corp
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Filing: 1988-04-05
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Granted: —
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Expires: 2008-04-05
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Abstract

Abstract PURPOSE:To obtain a MOS capacitor which can suppress a noise by forming a second impurity layer containing high concentration impurity on a first impurity layer facing an electrode layer through an insulating film. CONSTITUTION:In a MOS capacitor having a first impurity layer 2 formed on a semiconductor substrate 1, an insulating film 3 formed on the layer 2, and an electrode layer 4 formed on the film 3, a second impurity layer 11 containing further high concentration impurity is formed on the surface layer of the layer 2. For example, a P<+> type impurity region 11 is provided on the surface layer of the P-type impurity region 2. The region 11 becomes a lower resistance layer than the region 2. Thus, since the low resistance layer becomes one electrode facing a polysilicon electrode 4, the potential of the region 11 can be stabilized through an aluminium wiring layer 8, thereby suppressing a noise.

Inventors

  • 👤 Makoto Monoi
  • 👤 誠 物井

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 02:16
CPC Classifications
—

Claims Analysis

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References Cited (Backward Citations)

JPS6115359A Cited
JPS62226655A Cited

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