← Back to Patent Explorer
JPH01252902A Expired / Lapsed JP ⏱️ 0.0 years remaining

Low reflection diffraction grating and its production

Assignee: Kuraray Co Ltd
•
Filing: 1988-04-01
•
Granted: —
•
Expires: 2008-04-01
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract PURPOSE:To obtain the low reflection diffraction grating which is inexpensive and is highly reliable by providing a rugged structure having the periods smaller than the wavelengths of visible rays on the surface of the diffraction grating. CONSTITUTION:A copolymer consisting of an equal mole of methyl methacrylate and chloromethyl methacrylate, etc., is synthesized. Benzophenone is added to this copolymer at the mol equal to the mol of the chloromethyl methacrylate to prepare a 4wt.% benzene soln. and this soln. is applied on a glass substrate 21 to form a transparent photosensitive film 22. The film is exposed via. for example, a photomask 23 for the diffraction grating and is then subjected to two-beam interference exposing to bond the benzophenone to the chloromethyl methacrylate. Finally, the substrate is heated under a reduced pressure to sublimate the unreacted benzophenone, by which the diffraction grating 20 having the rugged surface is obtd. The low-reflection diffraction grating which is inexpensive and is highly reliable is thus obtd.

Inventors

  • 👤 Katsuya Fujisawa
  • 👤 藤沢 克也
  • 👤 Masao Uetsuki
  • 👤 植月 正雄

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-08 06:24
CPC Classifications
—

Claims Analysis

Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.

References Cited (Backward Citations)

JPS4920105A Cited
JPS5070040A Cited
JPS58174906A Cited

USPTO Annuity & Maintenance Windows

Maintenance schedule is calculated for granted US utility patents.

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag