Solid-state imaging device and method of manufacturing the same

Abstract

Abstract PROBLEM TO BE SOLVED: To provide a solid-state imaging device capable of improving the incidence efficiency of light to an image area, and a method of manufacturing the same.SOLUTION: A solid-state imaging device comprises: a plurality of photodiodes PD that are provided in a substrate 15 and each have a semiconductor region 17 of a first conductivity type; and an element isolation region 19 that is provided in the substrate 15, is composed of semiconductor regions of a second conductivity type, and isolates the plurality of photodiodes PD. The element isolation region 19 is inclined toward the center direction of an image area in which the plurality of photodiodes PD are arranged.

Inventors

• 👤 Kazuhiko Nakadate
• 👤 和彦 中舘

Bibliographic Details