Wavefront aberration measuring apparatus, exposure apparatus, semiconductor device manufacturing system and manufacturing method thereof

Abstract

Abstract Translated from Japanese 【課題】半導体装置の超微細化に伴って狭マージン化したとしても、露光レンズ（投影光学系）の僅かな波面収差の経時変化も考慮して高精度の露光を実現して超微細の半導体装置を高歩留りで製造できるようにした波面収差測定装置、露光装置並びに半導体装置製造システム及びその方法を提供することにある。 【解決手段】露光装置において、レチクルステージ上に、投影光学系の瞳上にほぼ均一に拡がる光を発生させるパターンを設け、投影光学系の瞳面と共役位置を作るリレーレンズと、該リレーレンズで作られた投影光学系の瞳面と共役位置に主平面を配置し、投影光学系の像面に形成された前記パターンの一次像からの光を波面分割して前記パターンの二次像を多数形成するレンズアレイと、該レンズアレイにより多数形成されたパターンの二次像を撮像して多数のパターン信号を出力する撮像素子と、該撮像素子から得られる多数のパターン信号を基に前記投影光学系の波面収差を算出する処理手段とを備えて構成した波面収差測定装置を設けたことを特徴とする。 【選択図】　図２ [PROBLEMS] To achieve high-precision exposure in consideration of a slight temporal change in wavefront aberration of an exposure lens (projection optical system) even if a margin is narrowed due to ultra-miniaturization of a semiconductor device. An object of the present invention is to provide a wavefront aberration measuring apparatus, an exposure apparatus, a semiconductor device manufacturing system, and a method therefor, which can manufacture the apparatus at a high yield. In an exposure apparatus, a pattern is provided on a reticle stage for generating light that spreads substantially uniformly on a pupil of a projection optical system, and a relay lens forms a conjugate position with a pupil plane of the projection optical system, and the relay lens. A main plane is arranged at a conjugate position with the pupil plane of the projection optical system made by the above, and a light from the primary image of the pattern formed on the image plane of the projection optical system is subjected to wavefront division to form a secondary image of the pattern. A lens array for forming a large number, an image sensor for imaging a secondary image of a pattern formed by the lens array to output a large number of pattern signals, and the projection based on a large number of pattern signals obtained from the image sensor A wavefront aberration measuring device including a processing unit for calculating a wavefront aberration of the optical system is provided. [Selection] Fig. 2

Inventors

• 👤 Yasuhiro Yoshitake
• 👤 吉武　康裕
• 👤 Shunichi Matsumoto
• 👤 松本　俊一

Bibliographic Details