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JP2000228516A Expired / Lapsed JP ⏱️ 0.0 years remaining

Semiconductor laminated thin films, electronic devices and diodes

Assignee: TDK Corp
•
Filing: 1999-02-08
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Granted: —
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Expires: 2019-02-08
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Abstract

Abstract Translated from Japanese (57)【要約】 【課題】 酸化物の薄膜技術とn型半導体を用いて、酸 化物の性質を利用した透明の半導体接合を実現し、これ を利用したダイオード、薄膜トランジスタなどの電子デ バイスを得る。 【解決手段】 基板上に、少なくとも、Cuを含む複合 酸化物を含有する無機物層と、n型導電性を示すn型半 導体酸化物層が積層されている半導体積層薄膜とした。 PROBLEM TO BE SOLVED: To realize a transparent semiconductor junction utilizing the properties of an oxide by using an oxide thin film technology and an n-type semiconductor, and to obtain an electronic device such as a diode and a thin film transistor using the same. . SOLUTION: The semiconductor laminated thin film has a structure in which at least an inorganic layer containing a composite oxide containing Cu and an n-type semiconductor oxide layer exhibiting n-type conductivity are laminated on a substrate.

Inventors

  • 👤 Yoshihiko Yano
  • 👤 義彦 矢野
  • 👤 Hiroshi Kawazoe
  • 👤 博司 川副

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 19:18
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/67; H10D30/674; H10D30/6755

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