FR2563377B1
Expired / Lapsed
FR
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METHOD FOR MANUFACTURING AN INSULATING LAYER BURIED IN A SEMICONDUCTOR SUBSTRATE, BY ION IMPLANTATION
Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1984-04-19
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Granted: 1987-01-23
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Expires: 2004-04-19
Abstract
No abstract record available.
Inventors
- 👤 Michel Bruel
- 👤 Jean Du Port De Poncharra
Bibliographic Details
Application Number
—
Jurisdiction
FR
Data Source
google_patents
Last Synchronized
2026-11-01 06:42
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/208; H10P30/209; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10P90/1908; H10W; H10W10/00; H10W10/10; H10W10/181
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