Lithographic development process using nitron-polyoxyalkyl - ene developers

Abstract

Abstract The polyoxyalkylene cpds. are those of general formula Y (C3H6O)n-E-R x where Y = an organic radical of valence = x. n,x = integers >1, such that the molecular weight of the polymer, without Y, E and R, is comprised between 800 and 3000. E = polyoxyethylene chain representing 10-70% of the molecular weight of the polymer, R = hydrogen, alkyl alkylcarbonyl, arylcarbonyl. The preferred compound is the oleylic ester of polyethylene glycol. Dependent upon the medium in which it is used, the nitron is employed in amounts of 0.5 mg - 1g (0.5 mg - 50 mg of added to the silver halide solution and 1 mg-1g if added to the emulsion) per gm atom of Ag., and the polyoxyalkylene cpd. is employed in amounts of 10mg-1g per gm-atom of Ag.

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