FR1508408A
Expired / Lapsed
FR
⏱️ 0.0 years remaining
Method and device for producing photolithographic structures, in particular on surfaces of semiconductor crystals
Assignee: Siemens AG
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Filing: 1966-12-05
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Granted: 1968-01-05
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Expires: 1986-12-05
Abstract
No abstract record available.
Inventors
No inventors recorded.
Bibliographic Details
Application Number
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Jurisdiction
FR
Data Source
google_patents
Last Synchronized
2026-10-26 12:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/704; H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2042
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