EP1127929A2
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EP
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Composition for film formation, method of film formation, and silica-based film
Assignee: JSR Corp
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Filing: 2001-02-26
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Granted: —
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Expires: 2021-02-26
Abstract
Abstract A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.
Inventors
- 👤 Eiji Hayashi
- 👤 Kouichi Hasegawa
- 👤 Seo Youngsoo
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 14:08
CPC Classifications
C; C09; C09D; C09D183/00; C09D183/04; H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6342; H10P14/66; H10P14/668; H10P14/6681; H10P14/6684; H10P14/6686; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; Y; Y10; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31652; Y10T428/31663
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
213 words
A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained
by hydrolyzing and condensing one or more silane compounds
selected from the group consisting of compounds represented by
the following formula (1), compounds represented by the
following formula (2), and compounds represented by the
following formula (3) in the presence of 0.2 mol or more of an
alkaline compound per mol of the silane compounds, R a Si(OR 1 ) 4-a wherein R represents a hydrogen atom, a fluorine atom, or a
monovalent organic group; R 1 represents a monovalent organic
group; and a Is an integer of 1 or 2; Si(OR 2 ) 4 wherein R 2 represents a monovalent organic group; R 3 b (R 4 O) 3-b Si- (R 7 ) d -Si(OR 5 ) 3-c R 6 c wherein R 3 to R 6 may be the same or different and each represents
a monovalent organic group; b and c may be the same or different
and each is a number of 0 to 2; R 7 represents an oxygen atom,
a phenylene group, or a group represented by -(CH 2 ) n -, wherein
n is an integer of 1 to 6; and d is 0 or 1; and (B) an organic solvent.
Claim 2
Dependent Claim
23 words
The composition for film formation of claim 1,
wherein the alkaline compound is selected from the group
consisting of ammonia and organic amines.
Claim 3
Dependent Claim
17 words
The composition for film formation of claim 2,
wherein the organic amines are alkylamines, alkanolamines, and
arylamines.
Claim 4
Dependent Claim
38 words
The composition for film formation of claim 1,
wherein the hydrolysis is conducted in the presence of from more
than 20 mol to 150 mol of water per mol of the compounds
represented by formulae (1) to (3).
Claim 5
Dependent Claim
30 words
The composition for film formation of claim 1,
wherein the silane compounds comprise at least one compound
represented by formula (1) and at least one compound represented
by formula (2).
Claim 6
Dependent Claim
16 words
The composition for film formation of claim 1, which
has a pH of 7 or lower.
Claim 7
Dependent Claim
216 words
A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained
by hydrolyzing and condensing one or more silane compounds
selected from the group consisting of compounds represented by
the following formula (1), compounds represented by the
following formula (2), and compounds represented by the
following formula (3) in the presence of an alkaline compound
and from 20 to 150 mol of water per mol of the silane compounds, R a Si (OR 1 ) 4-a wherein R represents a hydrogen atom, a fluorine atom, or a
monovalent organic group; R 1 represents a monovalent organic
group; and a Is an integer of 1 or 2; Si(OR 2 ) 4 wherein R 2 represents a monovalent organic group; R 3 b (R 4 O) 3-b Si-(R 7 ) d -Si(OR 5 ) 3-c R 6 c wherein R 3 to R 6 may be the same or different and each represents
a monovalent organic group; b and c may be the same or different
and each is a number of 0 to 2; R 7 represents an oxygen atom,
a phenylene group, or a group represented by -(CH 2 ) n -, wherein
n is an integer of 1 to 6; and d is 0 or 1; and (B) an organic solvent.
Claim 8
Dependent Claim
208 words
A process for producing a composition for film
formation which comprises hydrolyzing and condensing one or
more silane compounds selected from the group consisting of
compounds represented by the following formula (1), compounds
represented by the following formula (2), and compounds
represented by the following formula (3) in an organic solvent
in the presence of 0.2 mol or more of an alkaline compound per
mol of the silane compounds, R a Si(OR 1 ) 4-a wherein R represents a hydrogen atom, a fluorine atom, or a
monovalent organic group; R 1 represents a monovalent organic
group; and a Is an integer of 1 or 2; Si(OR 2 ) 4 wherein R 2 represents a monovalent organic group; R 3 b (R 4 O) 3-b Si- (R 7 ) d -Si (OR 5 ) 3-c R 6 c wherein R 3 to R 6 may be the same or different and each represents
a monovalent organic group; b and c may be the same or different
and each is a number of 0 to 2; R 7 represents an oxygen atom,
a phenylene group, or a group represented by -(CH 2 ) n -, wherein
n is an integer of 1 to 6; and d is 0 or 1.
Claim 9
Dependent Claim
25 words
A method of film formation which comprises applying
the composition for film formation of claim 1 to a substrate
and then heating the resultant coating.
Claim 10
Dependent Claim
13 words
A silica-based film obtained by the method of film
formation of claim 9.
References Cited (Backward Citations)
No citation records indexed.
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