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EP1090967A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Composition for film formation, method of film formation, and insulating film

Assignee: JSR Corp
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Filing: 2000-09-28
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Granted: —
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Expires: 2020-09-28
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Abstract

Abstract A polyorganosiloxane-based composition for film formation which gives a film having low dielectric constant and high modulus of elasticity and useful as an interlayer insulating film in semiconductor devices and the like. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an alkali catalyst, at least one member selected from the group consisting of compounds (1) represented by R a Si(OR 1 ) 4-a (wherein R represents hydrogen, fluorine, or a monovalent organic group; R 1 represents a monovalent organic group; and a Is an integer of 1 or 2), compounds (2) represented by Si(OR 2 ) 4 (wherein R 2 represents a monovalent organic group), and compounds (3) represented by R 3 b(R 4 O) 3-b Si-(R 7 ) d -Si(OR 5 ) 3-c R 6 c [wherein R 3 to R 6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each are an integer of 0 to 2; R 7 represents oxygen, phenylene, or a group represented by -(CH 2 ) n -, wherein n is an integer of 1 to 6; and d is 0 or 1]; and (B) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an acid catalyst, at least one member selected from the group consisting of the compounds (1), (2), and (3).

Inventors

  • 👤 Takahiko Kurosawa
  • 👤 Eiji Hayashi
  • 👤 Seo Youngsoon
  • 👤 Keiji Konno
  • 👤 Atsushi Shiota
  • 👤 Kinji Yamada

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-02 10:02
CPC Classifications
C; C08; C08L; C08L83/00; C08L83/04; C09; C09D; C09D183/00; C09D183/04; C09D183/14; H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6342; H10P14/66; H10P14/668; H10P14/6681; H10P14/6684; H10P14/6686; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; Y; Y10; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31652; Y10T428/31663

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 246 words
A composition for film formation which comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an alkali catalyst, at least one silane compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (B) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an acid catalyst, at least one silane compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3): R 3 Si(OR 1 ) 4-a wherein R represents hydrogen atom, fluorine atom, or a monovalent organic group; R 1 represents a monovalent organic group; and a is an integer of 1 or 2; Si(OR 2 ) 4 wherein R 2 represents a monovalent organic group; R 3 b (R 4 O) 3-b Si-(R 7 ) d -Si(OR 5 ) 3-c R 6 c wherein R 3 to R 6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each are an integer of 0 to 2; R 7 represents oxygen atom, a phenylene group, or a group represented by -(CH 2 ) n -, wherein n is an integer of 1 to 6; and d is 0 or 1.
Claim 2
Dependent Claim 35 words
The composition for film formation as claimed in claim 1, wherein said product of hydrolysis and condensation as ingredient (A) has a weight average molecular weight as determined by GPC of from 50,000 to 10,000,000.
Claim 3
Dependent Claim 35 words
The composition for film formation as claimed in claim 1, wherein said product of hydrolysis and condensation as ingredient (B) has a weight average molecular weight as determined by GPC of from 500 to 300,000.
Claim 4
Dependent Claim 57 words
The composition for film formation as claimed in any one of claims 1 to 3, wherein said ingredient (A) contains a product of the hydrolysis and condensation of at least one compound represented by the formula (2) in an amount of from 5 to 75% by weight (in terms of the product of complete hydrolysis and condensation).
Claim 5
Dependent Claim 50 words
The composition for film formation as claimed in any one of claims 1 to 3, wherein said ingredient (A) is a product of the hydrolysis and condensation of silane compounds comprising at least one compound represented by the formula (1) and at least one compound represented by the formula (2).
Claim 6
Dependent Claim 57 words
The composition for film formation as claimed in any one of claims 1 to 3, which comprises 100 parts by weight of said ingredient (A) (in terms of the product of complete hydrolysis and condensation) and from 1 to 900 parts by weight of said ingredient (B) (in terms of the product of complete hydrolysis and condensation).
Claim 7
Dependent Claim 23 words
The composition for film formation as claimed in any one of claims 1 to 3, which has a pH of 7 or lower.
Claim 8
Independent Claim 266 words
A method of film formation which comprises applying a composition for film formation on a substrate and then heating the composition, said composition for film formation comprising: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an alkali catalyst, at least one silane compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (B) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an acid catalyst, at least one silane compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3): R a Si(OR 1 ) 4-a wherein R represents hydrogen atom, fluorine atom, or a monovalent organic group; R 1 represents a monovalent organic group; and a is an integer of 1 or 2; Si(OR 2 ) 4 wherein R 2 represents a monovalent organic group; R 3 b (R 4 O) 3-b Si-(R 7 ) d Si(OR 5 ) 3-c R 6 c wherein R 3 to R 6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each are an integer of 0 to 2; R 7 represents oxygen atom, a phenylene group, or a group represented by -(CH 2 ) n -, wherein n is an integer of 1 to 6; and d is 0 or 1.
Claim 9
Dependent Claim 15 words
An insulating film obtained by the method of film formation as claimed in claim 8.
Claim 10
Dependent Claim 12 words
A semiconductor device having the insulating film as claimed in claim 9.

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