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EP0986072A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Process for treatment of a resist

Assignee: Ushio Denki KK
•
Filing: 1999-09-09
•
Granted: —
•
Expires: 2019-09-09
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Abstract

Abstract A process for curing a resist in which a resist is cured quickly and with high efficiency without gas, which is formed by irradiation with electron beams with which the resist is irradiated for curing, remaining in it and thereby increase its thermostability, is achieved by the following process steps: a first, the resist is irradiated with electron beams and kept at a temperature such that gas is produced and released in the resist, but no gas bubbles are formed in the resist; second, the resist is heated so that the gas produced in the first process step is dissipated to the outside from the resist; and third, the resist is irradiated with electron beams so that macromolecules are formed in the resist and the resist is cured. <IMAGE>

Inventors

  • 👤 Minoru Komori

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-30 22:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/38; H; H10; H10P; H10P76/00; G03F7/40; H01; H01B; H01B3/00; H01B3/18; H01B3/30; H01B3/36; Y; Y10; Y10S; Y10S430/00; Y10S430/143

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 100 words
Process for treatment of a resist in which the thermostability of the resist is increased by irradiation with electron beams, comprising the following process steps: first, irradiating the resist with electron beams and keeping it at a temperature such that gas is produced and released in the resist, but no gas bubbles are formed in the resist; second, heating the resist so that the gas produced in the first process step is dissipated to the outside from the resist; and third, irradiating the resist with electron beams so that macromolecules are formed in the resist and the resist is cured.
Claim 2
Dependent Claim 23 words
Process for treatment of a resist as claimed in claim 1, wherein, during the first step, the temperature is higher than room temperature.
Claim 3
Dependent Claim 24 words
Process for treatment of a resist as claimed in claim 2, wherein the temperature is raised to 60 to 85°C during the first step.
Claim 4
Dependent Claim 27 words
Process for treatment of a resist as claimed in any one of claims 1 to 3, wherein the heating temperature is raised during the second process step.
Claim 5
Dependent Claim 24 words
Process for treatment of a resist as claimed in claim 4, wherein the temperature is raised to 60 to 85°C during the second step.
Claim 6
Dependent Claim 33 words
Process for treatment of a resist as claimed in any one of claims 1 to 5, wherein the amount of irradiation is 600 µC/cm 2 to 1800 µC/cm 2 in the first step.
Claim 7
Dependent Claim 33 words
Process for treatment of a resist as claimed in any one of claims 1 to 6, wherein the amount of irradiation is 2700 µC/cm 2 to 5400 µC/cm 2 in the third step.

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