EP0846742A2
Expired / Lapsed
EP
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Chemical mechanical polishing slurry useful for copper substrates
Assignee: CMC Materials LLC
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Filing: 1997-12-05
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Granted: —
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Expires: 2017-12-05
Abstract
Abstract A chemical mechanical polishing slurry comprising a film forming agent, an oxidizer such as urea hydrogen peroxide, a complexing agent such as ammonium oxalate or tartaric acid, an abrasive, and an optional surfactant. Also disclose is a method for using the chemical mechanical polishing slurry composition to remove copper alloy, titanium, and titanium nitride containing layers from a substrate.
Inventors
- 👤 Vlasta Brusic Kaufman
- 👤 Rodney C. Kistler
- 👤 Shumin Wang
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 18:06
CPC Classifications
C; C23; C23F; C23F3/00; C23F3/04; C23F3/06; C09; C09G; C09G1/00; C09G1/02; C09K; C09K3/00; C09K3/14; C09K3/1409; H; H10; H10P; H10P52/00; H10P52/40; H10P52/403
Claims Analysis
Total Claims: 47
Claim 1
Independent Claim
14 words
A CMP slurry precursor composition comprising urea and at least one metal
oxide abrasive.
Claim 2
Dependent Claim
11 words
The composition of claim 1, further including a film forming agent.
Claim 3
Dependent Claim
12 words
The composition of claims 1 or 2, further including a complexing agent.
Claim 4
Dependent Claim
33 words
The composition of claims 1-3, wherein said composition comprises from
about 2.0 weight percent to about 24.0 weight percent urea and from about
1.0 to about 15.0 weight percent of an alumina abrasive.
Claim 5
Dependent Claim
42 words
The composition of claim 4, wherein said composition further comprises from
about 0.5 to about 3.0 weight percent ammonium oxalate; and from about
0.01 to about 0.2 weight percent benzotriazole; and from about 0.001 to
about 0.1 weight percent of a surfactant.
Claim 6
Dependent Claim
30 words
The composition of claim 4, wherein said composition further comprises from
about 0.5 to about 5.0 weight percent tartaric acid and from about 0.1 to
about 0.2 weight percent benzotriazole.
Claim 7
Dependent Claim
19 words
The composition of claims 1-4 or 6, wherein the composition has a pH from
about 5 to about 8.
Claim 8
Dependent Claim
23 words
The composition of claims 1-4 or 6-7, wherein the composition further
includes from about 0.001 to about 0.1 weight percent of a surfactant.
Claim 9
Dependent Claim
21 words
A chemical mechanical polishing slurry composition comprising: an abrasive; at least one oxidizer; a complexing agent; and a film forming agent.
Claim 10
Dependent Claim
20 words
A chemical mechanical polishing slurry composition comprising: an abrasive; urea hydrogen peroxide; a complexing agent; and a film forming agent.
Claim 11
Dependent Claim
32 words
The composition of claims 3-10, wherein the complexing agent is selected
from the group of compounds including citric acid, lactic acid, tartaric acid,
succinic acid, oxalic acids, amino acids and salts thereof.
Claim 12
Dependent Claim
12 words
The composition of claims 3-11, wherein the complexing agent is ammonium
oxalate.
Claim 13
Dependent Claim
22 words
The composition of claims 12, wherein the ammonium oxalate is present in an
amount ranging from 0.5 to about 3.0 weight percent.
Claim 14
Dependent Claim
19 words
A chemical mechanical polishing slurry composition comprising: an abrasive; urea hydrogen peroxide; tartaric acid; and a film forming agent.
Claim 15
Dependent Claim
23 words
The composition of claim 14, wherein the tartaric acid is present in an amount
ranging from about 0.5 to about 5.0 weight percent.
Claim 16
Dependent Claim
12 words
The composition of claims 2-15, wherein the film forming agent is
benzotriazole.
Claim 17
Dependent Claim
20 words
The composition of claim 16, wherein the benzotriazole is present in an
amount between 0.01 to about 0.1 weight percent.
Claim 18
Dependent Claim
17 words
The composition of claim 9, wherein the oxidizer is a compound that forms
hydroxyl radicals upon reduction.
Claim 19
Dependent Claim
25 words
The composition of claims 9 or 18, wherein the oxidizer is selected from the
group consisting of hydrogen peroxide, urea hydrogen peroxide and
combinations thereof.
Claim 20
Dependent Claim
28 words
The composition of claims 9-19, wherein the oxidizer is hydrogen peroxide or
urea hydrogen peroxide present in an amount ranging from about 0.3 to about
12 weight percent.
Claim 21
Dependent Claim
14 words
The composition of claims 9-20, wherein the abrasive is at least one metal
oxide.
Claim 22
Dependent Claim
25 words
The composition of claims 1-21, wherein the metal oxide abrasive is selected
from the group including alumina, ceria, germania, silica, titania, zirconia, and
mixtures thereof.
Claim 23
Dependent Claim
16 words
The composition of claims 1-22, wherein the abrasive is an aqueous
dispersion of a metal oxide.
Claim 24
Dependent Claim
34 words
The composition of claims 1-23, wherein the metal oxide abrasive consists of
metal oxide aggregates having a size distribution less than about 1.0 micron
and a mean aggregate diameter less than about 0.4 micron.
Claim 25
Dependent Claim
43 words
The composition of claims 1-23, wherein the metal oxide abrasive consists of
discrete, individual metal oxide spheres having a primary particle diameter
less than 0.400 micron and a surface area ranging from about 10 m 2 /g to
about 250 m 2 /g.
Claim 26
Dependent Claim
25 words
The composition of claims 1-25, wherein the abrasive has a surface area
ranging from about 5 m 2 /g to about 430 m 2 /g.
Claim 27
Dependent Claim
25 words
The composition of claim 26, wherein the abrasive has a surface area of from
about 30 m 2 /g to about 170 m 2 /g.
Claim 28
Dependent Claim
20 words
The composition of claims 1-27, wherein the abrasive is selected from the
group consisting of precipitated abrasives or fumed abrasives.
Claim 29
Dependent Claim
18 words
The composition of claims 1-28, wherein the composition has a pH of from
about 2 to about 12.
Claim 30
Dependent Claim
18 words
The composition of claim 29, wherein the composition has a pH of from
about 4 to about 9.
Claim 31
Dependent Claim
18 words
The composition of claim 30, wherein the composition has a pH of from
about 5 to about 8.
Claim 32
Dependent Claim
30 words
A chemical mechanical polishing slurry composition comprising: an abrasive; an oxidizing agent selected From the group consisting of hydrogen peroxide, urea hydrogen peroxide, and mixtures thereof; ammonium oxalate; and benzotriazole.
Claim 33
Dependent Claim
48 words
The composition of claim 32, wherein the composition comprises: from about 1.0 to about 15.0 weight percent of an metal oxide abrasive; from about 0.3 to about 12.0 weight percent hydrogen peroxide or urea
hydrogen peroxide; from about 0.5 to about 3.0 weight percent ammonium oxalate; and
benzotriazole.
Claim 34
Dependent Claim
24 words
The composition of claims 32 or 33, wherein the benzotriazole is present in
an amount ranging from about 0.01 to about 0.2 weight percent.
Claim 35
Dependent Claim
10 words
The composition of claims 32-34, wherein the abrasive is alumina.
Claim 36
Dependent Claim
32 words
A chemical mechanical polishing slurry composition comprising: an abrasive; urea hydrogen peroxide; from about 0.5 to about 3.0 weight percent ammonium oxalate; and from about 0.01 to about 0.2 weight percent benzotriazole.
Claim 37
Dependent Claim
33 words
The composition of claim 36, wherein said composition includes from about
1.0 to about 15.0 weight percent of an alumina abrasive and from about 0.3
to about 12.0 weight percent urea hydrogen peroxide.
Claim 38
Dependent Claim
62 words
A chemical mechanical polishing slurry composition comprising: from about 1.0 to about 15.0 weight percent of an alumina abrasive; from about 0.3 to about 12.0 weight percent urea hydrogen peroxide; from about 0.5 to about 3.0 weight percent a tartaric acid; and from about 0.01 to about 0.2 weight percent benzotriazole, the composition
having a pH of from about 4.0 and 9,0.
Claim 39
Dependent Claim
15 words
The composition of claims 1-4, 6-7 or 9-38, which further includes at least
one surfactant.
Claim 40
Independent Claim
102 words
A method for polishing a substrate including at least one metal layer
comprising the steps of: (a) admixing the composition of claims 1-8 or 21-28 and deionized water to
form a chemical mechanical polishing slurry precursor composition; (b) admixing the precursor composition of step (a) with hydrogen peroxide to
form a chemical mechanical polishing slurry composition; (c) applying the chemical mechanical polishing slurry composition of step (b)
to the substrate; and (d) removing at least a portion of the metal layer from the substrate by
bringing a pad into contact with the substrate and moving the pad in
relation to the substrate.
Claim 41
Dependent Claim
49 words
The method of claim 40, wherein the hydrogen peroxide of step (b) is
admixed with the precursor composition of step (a) at a ratio from about 0.75
moles of urea to 1 mole of hydrogen peroxide to about 2 moles of urea to
about 1.0 moles of hydrogen peroxide.
Claim 42
Independent Claim
56 words
A method for polishing a substrate comprising the steps of: (a) applying the chemical mechanical polishing slurry composition of claims
9-39 to the substrate; and (b) removing at least a portion of the metal layer from the substrate by
bringing a pad into contact with the substrate and moving the pad in
relation to the substrate.
Claim 43
Independent Claim
14 words
The method of claims 40-42, wherein the substrate includes a copper alloy
containing layer.
Claim 44
Dependent Claim
30 words
The method of claim 40-43, wherein the substrate further includes a titanium
and titanium nitride layer wherein at least a portion of the titanium and
titanium nitride layer is removed.
Claim 45
Independent Claim
27 words
The method of claims 40-44, wherein the chemical mechanical polishing
slurry composition is applied to the pad before the pad is placed into contact
with the substrate.
Claim 46
Dependent Claim
27 words
A chemical mechanical polishing composition multi-package system
comprising: (a) a first container comprising the composition of claims 1-8 or 21-28; (b) a second container comprising hydrogen peroxide.
Claim 47
Dependent Claim
53 words
A chemical mechanical polishing composition multi-package system
comprising: (a) a first container including a film forming agent and a complexing agent; (b) a second container comprising an oxidizing agent; and (c) an abrasive located in a container selected from the group consisting of
the first container, the second container, or a third container.
References Cited (Backward Citations)
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