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EP0821415A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

A capacitor and method of manufacture thereof

Assignee: Texas Instruments Inc
•
Filing: 1997-07-28
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Granted: —
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Expires: 2017-07-28
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Abstract

Abstract The purpose of this invention is to provide a ferroelectric capacitor and a ferroelectric memory device, which: can perform stable operation without causing a resistivity change that is considered to be caused due to the leakage current and the oxygen diffusion; in which it is difficult for dielectric fatigue to be caused in the ferroelectric capacitor, even by repeated inversions; and in which long life and high reliability can be maintained; and to provide their manufacturing method. The constitution of this invention includes a ferroelectric capacitor CAP which has Ir lower electrode (13), PZT thin film (14), and Ir upper electrode (15) and in which crystal grain layers (14a,14b,and 14c) constituted by assembling crystal grains (50a,50b,and 50c) by means of grain boundaries (51a,51b, and 51c) are laminated by means of grain boundaries (52A and 52B) along the surface of the Ir electrode (13), so that the ferroelectric film (14) is formed. A method for manufacturing the ferroelectric capacitor CAP, which meets all of the important conditions of 1) selection of an optimum electrode substance such as Ir; 2) control of crystal growth direction by means of TiO x nucleus attachment and a surplus of Pb; and 3) optimum annealing temperature for eliminating surface precipitates; and which deposits a titanium oxide, forms a ferroelectric film material layer containing a surplus of lead on it, heats it at a temperature at which the surface precipitates are substantially lost, and laminates each crystal grain layer (14a,14b, and 14c) by repeating the above processes.

Inventors

  • 👤 Yukio Fukuda
  • 👤 Katsuhiro Aoki
  • 👤 Ken Numata
  • 👤 Akitoshi Nishimura

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-09 04:26
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/682; H10D1/684; H10B; H10B53/00; H10D1/692

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 61 words
A capacitor comprising; a first electrode formed from a metal that is easily oxidised; a ferroelectric film formed substantially over the first electrode; a second electrode formed on ferroelectric film; and wherein multiple crystal grain layers are constituted by assembling crystal grains by means of grain boundaries along a surface of the first electrode such that said ferroelectric film is formed.
Claim 2
Dependent Claim 57 words
The capacitor as claimed in Claim 1, wherein grain boundaries extending substantially from the first electrode to the second electrode in each of the multiple crystal grain layers occur at different positions between the multiple crystal grain layers such that grain boundaries between the multiple crystal grain layers exist continuously along the surface of the first electrode.
Claim 3
Dependent Claim 30 words
The capacitor as claimed in Claim 1 or Claim 2, wherein the first and second electrodes are formed from iridium and the ferroelectric film is formed from lead zirconate titanate.
Claim 4
Dependent Claim 17 words
A memory device comprising one or more capacitors as claimed in any of Claims 1 to 3.
Claim 5
Independent Claim 66 words
A method for manufacturing a capacitor comprising; forming a first electrode from a metal that is easily oxidised; forming a ferroelectric film substantially over the first electrode; forming a second electrode on the ferroelectric film; and wherein the step of forming the ferroelectric film comprises constituting multiple crystal grain layers by assembling crystal grains by means of grain boundaries along a surface of the first electrode.
Claim 6
Dependent Claim 158 words
The method as claimed in Claim 5, wherein the step of forming the ferroelectric film comprises; depositing a first oxide layer comprising at least one element of the constituent elements of the ferroelectric film; forming a first ferroelectric material layer comprising a surplus of a constituent element of the ferroelectric film on the oxide layer; forming a lower crystal grain layer by heating at a temperature at which surface precipitates mainly composed of said constituent element are substantially lost; depositing a second oxide layer of at least one element of the constituent elements of the ferroelectric film on the lower crystal grain layer; forming a second ferroelectric film layer containing a surplus of a constituent element of the ferroelectric film on the lower crystal grain layer on which the second oxide layer is deposited; forming an upper crystal grain layer by heating at a temperature at which surface precipitates mainly composed of the constituent element are substantially lost.
Claim 7
Dependent Claim 31 words
The method as claimed in Claim 6, wherein the steps of depositing the second oxide layer, forming the second ferroelectric film layer, and forming an upper crystal grain layer are repeated.
Claim 8
Independent Claim 21 words
The method as claimed in any of Claims 5 to 7, further comprising; forming the ferroelectric film from lead zirconate titanate.
Claim 9
Independent Claim 31 words
The method as claimed in any of Claims 6 to 8, wherein the steps of depositing the first oxide layer and forming the second ferroelectric film layer comprise depositing titanium oxide.
Claim 10
Independent Claim 36 words
The method as claimed in any of Claims 6 to 9, wherein the steps of forming the first and second ferroelectric layers comprise forming an amorphous layer of lead zirconate titanate containing a surplus of lead.
Claim 11
Independent Claim 48 words
The method as claimed in any of Claims 6 to 10, wherein the steps of forming the lower and upper crystal grain layer comprise annealing said capacitor at a temperature at which surface precipitates substantially composed of surplus lead are substantially lost; and post-annealing said crystal grain layer.
Claim 12
Dependent Claim 66 words
The method as claimed in Claim 10 or Claim 11, wherein the step of forming an amorphous layer of lead zirconate titanate containing a surplus of lead comprises forming a layer in which the lead content of the amorphous layer is 1.02 - 1.50 times, at an atomic ratio, the total amount zirconium and titanium, and performing the annealing and post-annealing at 625 Celsius or higher.
Claim 13
Independent Claim 64 words
The method as claimed in any of Claims 8 to 12 further comprising; forming a titanium oxide on the lower electrode; forming the ferroelectric film using a sol-gel process in which a precursor solution of lead zirconate titanate is distributed on the lower electrode; forming an amorphous layer of lead zirconate titanate by heating the precursor solution; and crystallising the amorphous layer by annealing.
Claim 14
Independent Claim 34 words
The method as claimed in any of Claims 5 to 13, wherein the steps of forming the first and second oxide layers comprises depositing an oxide to a thickness of 0.01 - 10 nm.
Claim 15
Independent Claim 25 words
A method of fabricating a memory cell comprising at least one capacitor is formed according to the method of any of Claims 5 to 14.

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