Antireflective coating compositions

Claim 2

The antireflective composition of claim 1 wherein the resin binder has an optical density of at least about 4 units/µ at 248 nm.

Claim 3

The antireflective composition of claim 1 wherein the resin binder is formed by polymerization of one or more monomers that contain a quinolinyl group, quinolinyl derivative having a N, O or S ring substituent, phenanthrenyl group, acridine group or alkylene anthracene group.

Claim 4

The antireflective composition of claim 1 wherein the resin binder comprises a polymer corresponding to the following formula: wherein each R and R 1 is independently hydrogen or a substituted or unsubstituted alkyl group having from 1 to about 8 carbon atoms; each R 2 is independently substituted or unsubstituted alkyl having 1 to about 10 carbon atoms; each R 3 is independently halogen, alkyl having 1 to about 8 carbon atoms, alkoxy having 1 to about 8 carbon atoms, alkenyl having 2 to about 8 carbon atoms, alkynyl having 2 to about 8 carbon atoms, cyano, or nitro; m is an integer of from 0 to 9; and x is from about 10 to about 80 percent; and y is from about 5 to 90 percent.

Claim 5

The antireflective composition of claim 4 wherein R 2 is a hydroxyalkyl.

Claim 6

The antireflective composition of claim 4 wherein the sum of x and y is about 100 percent.

Claim 7

The antireflective composition of claim 1 wherein the resin binder comprises a polymer of the following structure: wherein x and y are mole fractions of the respective units.

Claim 8

The antireflective composition of claim 1 wherein the resin binder comprises a polymer corresponding to the following formula: wherein R 4 and R 5 are each independently hydrogen or a substituted or unsubstituted alkyl group having from 1 to about 8 carbon atoms; each R 6 is independently substituted or unsubstituted alkyl having 1 to about 10 carbon atoms, more typically 1 to about 6 carbons; W is a bond or substituted or unsubstituted alkylene having 1 to about 4 carbons; Z is a carbon, nitrogen, oxygen or sulfur; each R 7 independently is halogen, alkyl having 1 to about 8 carbon atoms, alkoxy having 1 to about 8 carbon atoms, alkenyl having 2 to about 8 carbon atoms, alkynyl having 2 to about 8 carbon atoms, cyano or nitro; n is an integer of from 0 to 7; x' is from about 10 to about 80 percent; and y' is from about 5 to 90 percent.

Claim 9

The antireflective composition of claim 1 wherein the resin binder comprises a polymer having the following structure: wherein x and y are mole fractions of the respective units.

Claim 10

The antireflective composition of claim 1 wherein the crosslinker is a methoxy methylated glycouril.

Claim 11

The antireflective composition of claim 1 wherein the crosslinker compound has the following structure:

Claim 12

The antireflective composition of claim 1 wherein the crosslinker is a polyhydroxy compound.

Claim 13

The antireflective composition of claim 12 wherein the crosslinker is an aromatic compound with at least one hydroxy and at least one hydroxy alkyl substituent.

Claim 14

The antireflective composition of claim 1 further comprising an acid or acid generator compound.

Claim 15

A coated substrate comprising: a substrate having thereon a coating layer of an antireflective composition of claim 1, and a coating layer of a photoresist over the antireflective layer.

Claim 16

A method for forming a photoresist relief image comprising: (a) applying on a substrate a layer of an antireflective composition of claim 1; (b) thermally curing the antihalation composition layer; (c) applying a layer of a photoresist composition over the antireflective composition layer; (d) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer.

Claim 17

The method of claim 16 wherein the activating radiation is in the deep UV range and the photoresist generates a sulfonic acid upon exposure.

Claim 18

The method of claim 16 where the antireflective composition further comprises an acid or thermal acid generator and is essentially free of a photoacid generator compound.