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EP0782040A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Method for manufacturing liquid crystal display

Assignee: Samsung Electronics Co Ltd
•
Filing: 1996-12-10
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Granted: —
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Expires: 2016-12-10
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Abstract

Abstract A method for manufacturing a liquid crystal display which reduces the number of photolithography processes is provided. The method includes the steps of forming a gate electrode and a gate pad by depositing a first metal film and a second metal film on a substrate of a TFT area and a gate-pad connecting area, respectively, in the described order, by a first photolithography process, forming an insulating film on the entire surface of the substrate on which the gate electrode and the gate pad are formed, forming a semiconductor film pattern on the insulating film of the TFT area by a second photolithography process, forming a source electrode/drain electrode and pad electrode composed of a third metal film using a third photolithography process in the TFT portion and pad portion, respectively, forming a passivation film pattern which exposes a portion of the drain electrode, a portion of the gate pad, and a portion of the pad electrode by a fourth photolithography process, exposing the first metal film by etching the second metal film which constitutes the gate pad using the passivation film pattern as a mask, and forming a pixel electrode connected to the drain electrode of the TFT area for connecting the gate pad of the gate-pad connecting area to the pad electrode of the pad area using a fifth photolithography process. Therefore, it is possible to reduce the number of photolithography processes, to improve the manufacturing yield, and to supress growth of a hillock of an Al film.

Inventors

  • 👤 Young-Chan Kweon

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-05 15:48
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1345; G02F1/13458; G02F1/1343; G02F1/13439; G02F1/136; G02F1/1362; H; H10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/031; H10D30/0312; H10D30/0316; H10D30/0321; H10D30/60; H10D30/67; H10D30/6729; H10D30/6737; H10D30/6739; H10D86/00; H10D86/01; H10D86/021; H10D86/0231; H10D86/40; H10D86/441; H10D86/60

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 212 words
A method for manufacturing a liquid crystal display, comprising the steps of: forming a gate electrode and a gate pad by depositing a first metal film and a second metal film on a substrate of a TFT area and a gate-pad connecting area, respectively, in the described order, by a first photolithography process; forming an insulating film on the entire surface of said substrate on which the gate electrode and the gate pad are formed; forming a semiconductor film pattern on said insulating film of the TFT area by a second photolithography process; forming a source electrode/drain electrode and pad electrode composed of a third metal film using a third photolithography process in the TFT portion and pad portion, respectively; forming a passivation film pattern which exposes a portion of said drain electrode, a portion of said gate pad, and a portion of the pad electrode by a fourth photolithography process; exposing said first metal film by etching said second metal film which constitutes said gate pad using said passivation film pattern as a mask; and forming a pixel electrode connected to said drain electrode of said TFT area for connecting said gate pad of said gate-pad connecting area to said pad electrode of said pad area using a fifth photolithography process.
Claim 2
Dependent Claim 37 words
A method for manufacturing a liquid crystal display as claimed in claim 1, wherein said first metal film is formed of a refractory metal and said second metal film is formed of Al or an Al alloy.
Claim 3
Dependent Claim 33 words
A method for manufacturing a liquid crystal display as claimed in claim 2, wherein said first metal film is formed of one selected from the group consisting of Cr, Ta, Mo, and Ti.
Claim 4
Dependent Claim 33 words
A method for manufacturing a liquid crystal display as claimed in claim 1, wherein said third metal film is formed of one selected from the group consisting of Cr, Ta, Mo, and Ti.
Claim 5
Dependent Claim 37 words
A method for manufacturing a liquid crystal display as claimed in claim 1, wherein taper etching is performed on said second metal film in said first photolithography process and then etching said first metal film is performed.
Claim 6
Dependent Claim 26 words
A method for manufacturing a liquid crystal display as claimed in claim 1, wherein said first metal film is formed wider than said second metal film.
Claim 7
Independent Claim 231 words
A method for manufacturing a liquid crystal display, comprising the steps of: forming a gate electrode and a gate pad by depositing a first metal film and a second metal film on a substrate of a TFT area and a pad area, respectively, in the order described, by a first photolithography process; forming an insulating film on the entire surface of said substrate on which the gate electrode and the gate pad are formed; forming a semiconductor film pattern on said insulating film of the TFT area by a second photolithography process; forming a source electrode and a drain electrode composed of a third metal film in the TFT area by a third photolithography process; forming a passivation film pattern which exposes a portion of said drain electrode of said TFT area and a portion of said gate pad of said pad area by forming a passivation film on the entire surface on which the source electrode and the drain electrode are formed and performing a fourth photolithography process on said passivation film and said insulating film; exposing said first metal film of the pad area by etching said second metal film using said passivation film pattern as a mask; and forming a pixel electrode which is connected to said drain electrode of said TFT area and contacts said first metal film of said pad area by a fifth photolithography process.
Claim 8
Dependent Claim 37 words
A method for manufacturing a liquid crystal display as claimed in claim 7, wherein said first metal film is formed of a refractory metal and said second metal film is formed of Al or an Al alloy.
Claim 9
Dependent Claim 33 words
A method for manufacturing a liquid crystal display as claimed in claim 8, wherein said first metal film is formed of one selected from the group consisting of Cr, Ta, Mo, and Ti.
Claim 10
Dependent Claim 33 words
A method for manufacturing a liquid crystal display as claimed in claim 7, wherein said third metal film is formed of one selected from the group consisting of Cr, Ta, Mo, and Ti.
Claim 11
Dependent Claim 37 words
A method for manufacturing a liquid crystal display as claimed in claim 7, wherein taper etching is performed on the second metal film in said first photolithography process and then etching said first metal film is performed.
Claim 12
Dependent Claim 42 words
A method for manufacturing a liquid crystal display as claimed in claim 7, wherein said insulating film is formed of a nitride film SiN x or a double film of a nitride film SiN x and an oxide film SiO x .

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