Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
63 words
A method of forming a thin film with a plasma chemical vapor deposition method, comprising the steps of: supplying as a material gas into a reaction chamber; generating a plasma in the reaction chamber using the supplied material gas; and depositing an amorphous carbon thin film on a substrate while preventing deposition of an adhesion on an inner wall of the reaction chamber.
Claim 2
Dependent Claim
52 words
A method according to claim 1, wherein said depositing step includes: heating at least a part of the inner wall of the reaction chamber to a temperature equal to or higher than a temperature at which adhesion coefficient of the adhesion is 0 such that the deposition of the adhesion is prevented.
Claim 3
Dependent Claim
43 words
A method according to claim 1 wherein said depositing step includes: heating at least a part of an inner wall of the reaction chamber to a temperature equal to or higher than 200 °C such that the deposition of the adhesion is prevented.
Claim 4
Dependent Claim
38 words
A method according to claim 1, wherein said depositing step includes: applying to the electrically conductive reaction chamber a bias voltage such that the deposition of the adhesion to the inner wall of the reaction chamber is prevented.
Claim 5
Dependent Claim
33 words
A method according to claim 2 or 3, wherein the reaction chamber is made from a material having a thermal conductivity sufficient to unify a temperature of the whole of the reaction chamber.
Claim 6
Dependent Claim
14 words
A method according to claim 5, wherein the reaction chamber is made from aluminum.
Claim 7
Dependent Claim
39 words
A method according to claim 4, wherein said applying step includes: applying one of a DC bias, a high frequency bias and a high frequency bias imposed on a DC bias having a predetermined voltage to the reaction chamber.
Claim 8
Dependent Claim
18 words
A method according to claim 7, wherein the predetermined voltage is equal to or lower than -100 V.
Claim 9
Independent Claim
38 words
A method according to any one of claims 1 to 8, wherein the thin film is an amorphous carbon thin film and the material gas includes at least one of a hydrocarbon gas and a carbon fluoride gas.
Claim 10
Dependent Claim
29 words
A method according to claim 9, wherein the amorphous carbon thin film further includes at least one element selected from the group consisting of hydrogen, fluorine, nitrogen and silicon.