EP0711029A2
Expired / Lapsed
EP
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Microstructure and method of forming the same
Assignee: Canon Inc
•
Filing: 1995-11-06
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Granted: —
•
Expires: 2015-11-06
Abstract
Abstract There is provided a microstructure comprising a substrate 10, support members 13, 13', a lever 12 and an electrode 17 formed on the lever is characterized in that said support members support said substrate and said beam and/or the electrode section with a void interposed therebetween and an electrode is formed on the lower surface of said beam. There are also provided a method of forming such a microstructure and an electrostatic actuator having a beam that is displaced by applying a voltage to the electrodes of the actuator.
Inventors
- 👤 Takayuki c/0 Canon K.K. Yagi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 15:07
CPC Classifications
H; H01; H01H; H01H59/00; H01H59/0009; H02; H02N; H02N1/00; H02N1/002; H02N1/006; Y; Y10; Y10S; Y10S977/00; Y10S977/84; Y10S977/849; Y10S977/86; Y10S977/873
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
54 words
A microstructure comprising a substrate, a
support section and a beam having an electrode, wherein
said support section suspends said beam separated from
said substrate by an air space and is attached to the
upper surface of said beam, and said
electrode is a movable electrode formed on the lower
surface of said beam.
Claim 2
Dependent Claim
16 words
A microstructure according to claim 1, wherein
said support section is made of metal thin film.
Claim 3
Dependent Claim
15 words
A microstructure according to claim 2, wherein
said metal thin film is made of aluminium.
Claim 4
Dependent Claim
14 words
A microstructure according to claim 1, wherein
said beam is made of crystalline Si.
Claim 5
Dependent Claim
18 words
A microstructure according to claim 1, wherein
said beam is made of thin film of an insulating
material.
Claim 6
Dependent Claim
29 words
A microstructure according to claim 5, wherein
said thin film of an insulating material is comprised
of a silicon dioxide film formed by thermally oxidizing
Si with oxidizing gas.
Claim 7
Dependent Claim
15 words
A microstructure according to claim 1, wherein
said electrode is made of electroconductive thin film.
Claim 8
Dependent Claim
18 words
A microstructure according to claim 1, wherein
another electrode is formed on the upper surface of said
beam.
Claim 9
Independent Claim
84 words
A method of forming a microstructure which
comprises steps of: forming a structure layer on a second substrate, forming an electrode section of an
electroconductive material on said structure layer, forming an adhesive layer of resin film on a first
and/or said second substrate, joining said first substrate and the structure
layer and electrode section with said adhesive layer, removing said second substrate, forming a support layer for connecting said
structure layer and electrode section to said first
substrate and removing said adhesive layer.
Claim 10
Dependent Claim
36 words
A method of forming a microstructure
according to claim 9, wherein said step of forming said
adhesive layer is carried out by applying a solution of
resin diluted by a solvent to form a thin film.
Claim 11
Dependent Claim
18 words
A method of forming a microstructure
according to claim 9, wherein said resin film is made
of photoresist.
Claim 12
Dependent Claim
16 words
A method of forming a microstructure
according to claim 11, wherein said photoresist
contains cyclopolymerized rubber.
Claim 13
Dependent Claim
21 words
A method of forming a microstructure
according to claim 9, wherein a groove ia formed on
said first and/or second substrates.
Claim 14
Dependent Claim
26 words
A method of forming a microstructure
according to claim 9, wherein said joining step
includes a step of applying pressure to said first and
second substrates.
Claim 15
Dependent Claim
29 words
A method of forming a microstructure
according to claim 14, wherein said step of applying
pressure is carried out by applying a voltage to said
first and second substrates.
Claim 16
Dependent Claim
20 words
A method of forming a microstructure
according to claim 9, wherein said support layer is
made of metal thin film.
Claim 17
Dependent Claim
26 words
A method of forming a microstructure
according to claim 9, wherein said step of removing
said adhesive layer is carried out by dry etching using
oxygen.
Claim 18
Dependent Claim
17 words
A method of forming a microstructure
according to claim 17, wherein said dry etching is
plasma etching.
Claim 19
Dependent Claim
23 words
A method of forming a microstructure
according to claim 9, wherein said second substrate for
forming a structure layer is an SOI substrate.
Claim 20
Dependent Claim
119 words
An electrostatic actuator formed by a method
according to any of Claims 9 through 19 and comprising
a substrate, fixed and drive electrodes formed on said
substrate and a beam having a movable electrode which
beam is supported above said drive electrode by a
support section of metal thin film through an air space
interposed between said drive electrode and said beam,
wherein said movable electrode is formed on the lower
surface of the beam with said support section
electrically connects said movable electrode and said
fixed electrode and mechanically holds said beam at the
upper surface of said beam such that said beam can be
displaced by applying a voltage between said drive
electrode and said movable electrode.
Claim 21
Dependent Claim
17 words
An electrostatic actuator according to claim
20, wherein said beam has another electrode on said upper
surface.
References Cited (Backward Citations)
No citation records indexed.
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